Apparatus for monitoring processing of a substrate

专利名称：Apparatus for monitoring processing of a

substrate

发明人：Michael Grimbergen,Shaoher X. Pan申请号：US08/944240申请日：19971006公开号：US06129807A公开日：20001010

摘要：Apparatus for in-situ monitoring of a process in a semiconductor waferprocessing system consists of a process chamber having a dome, an enclosure disposedabove the chamber, a process monitoring assembly positioned proximate the dome, anopening in the dome, and a window covering the opening. A portion of the apparatussupports the process monitoring assembly to establish a line-of-sight propagation pathof monitoring beams from above the dome, through the window to the substrate tofacilitate etch depth measurement without encountering interference from high powerenergy sources proximate the chamber. A method of fabricating a process monitoringapparatus consists of the steps of boring an opening into a dome, positioning theprocess monitoring assembly in proximity to the dome so as to allow a line-of- sightpropagation path of monitoring beams from the process monitoring assembly to a wafer,and covering the opening with a window. The window is permanent or removabledependent upon the type of process monitoring assembly being used in the system.

申请人：APPLIED MATERIALS, INC.

代理机构：Janah and Associates

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