专利名称:Method for manufacturing an ear device
having a retention element
发明人:Haussmann, Mathias申请号:EP04030650.8申请日:20041223公开号:EP16730A1公开日:20060628
专利附图:
摘要:The invention relates to a method for manufacturing a first ear device having(12) a first retention element (14) to be worn at least in part in the outer ear and/or earcanal of a user and a second ear device (12') having a second retention element (14') to
be worn at least in part in the outer ear and/or ear canal of said user, comprising: defininga data format; measuring the inner shape of the user's outer ear and/or ear canal;manufacturing said first retention element, wherein the outer surface of said firstretention element is individually shaped according to said measured inner shape of theuser's outer ear and/or ear canal; obtaining a digital data set according to said dataformat, which is representative of said measured inner shape of the user's outer earand/or ear canal; providing the user with a personal copy (18) of said digital data set forpersonal use by said user; and using said personal copy of said digital data set formanufacturing said second retention element, wherein the outer surface of said secondretention element is individually shaped according to said measured inner shape of theuser's outer ear and/or ear canal.
申请人:PHONAK AG
地址:Laubisrütistrasse 28 8712 Stäfa CH
国籍:CH
代理机构:Schwan - Schwan - Schorer
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