Apparatus for inspection with electron beam, metho

专利名称：Apparatus for inspection with electron

beam, method for operating same, andmethod for manufacturing semiconductordevice using former

发明人：Toshifumi Kimba,Tohru Satake,Tsutomu

Karimata,Kenji Watanabe,NobuharuNoji,Takeshi Murakami,MasahiroHatakeyama,Mamoru Nakasuji,HirosiSobukawa,Shoji Yoshikawa,ShinOowada,Mutsumi Saito

申请号：US11037084申请日：20050119

公开号：US20050121611A1公开日：20050609

专利附图：

摘要：A substrate inspection apparatus -(FIG. ) of the present invention performs thefollowing steps of: carrying a substrate “S” to be inspected into an inspection chamber-; maintaining a vacuum in said inspection chamber; isolating said inspection chamber froma vibration; moving successively said substrate by means of a stage -with at least onedegree of freedom; irradiating an electron beam having a specified width; helping saidelectron beam reach to a surface of said substrate via a primary electron optical system -;trapping secondary electrons emitted from said substrate via a secondary electronoptical system -and guiding it to a detecting system -; forming a secondary electronimage in an image processing system based on a detection signal of a secondary electronbeam obtained by said detecting system; detecting a defective location in said substratebased on the secondary electron image formed by said image processing system;

indicating and/or storing said defective location in said substrate by CPU -; and taking saidcompletely inspected substrate out of the inspection chamber. Thereby, the defectinspection on the substrate can be performed successively with high level of accuracy andefficiency as well as with higher throughput.

申请人：Toshifumi Kimba,Tohru Satake,Tsutomu Karimata,Kenji Watanabe,NobuharuNoji,Takeshi Murakami,Masahiro Hatakeyama,Mamoru Nakasuji,Hirosi Sobukawa,ShojiYoshikawa,Shin Oowada,Mutsumi Saito

地址：Kanagawa JP,Kanagawa JP,Kanagawa JP,Kanagawa JP,Kanagawa JP,TokyoJP,Kanagawa JP,Kanagawa JP,Kanagawa JP,Tokyo JP,Kanagawa JP,Kanagawa JP

国籍：JP,JP,JP,JP,JP,JP,JP,JP,JP,JP,JP,JP

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