GAS PURIFICATION METHOD

专利名称：GAS PURIFICATION METHOD发明人：MIYAZAWA, Yuzuru,KOBAYASHI,

Yoshihiko,HARAYA, Kenji,YOSHIMUNE, Miki

申请号：EP08837162.0申请日：20081009公开号：EP2208522A1公开日：20100721

专利附图：

摘要：A gas purification method of the present invention uses a carbon membranehaving a molecular sieving action to purify at least one selected from the group

consisting of a hydride gas, a hydrogen halide gas, and a halogen gas, each gas containing

an impurity at 10 ppm or less. The present invention can be used for a recovery unit thatrecoveries a used gas to reuse it as an ultrapure semiconductor material gas, and a unitor equipment that produces or charges an ultrapure semiconductor material gas.

申请人：Taiyo Nippon Sanso Corporation,National Institute of Advanced IndustrialScience and Technology

地址：3-26, Koyama 1-chome Shinagawa-ku Tokyo 142-8558 JP,3-1, Kasumigaseki 1-chome Chiyoda-ku Tokyo 100-21 JP

国籍：JP,JP

代理机构：Lamb, Martin John Carstairs

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