专利名称:GAS PURIFICATION METHOD发明人:MIYAZAWA, Yuzuru,KOBAYASHI,
Yoshihiko,HARAYA, Kenji,YOSHIMUNE, Miki
申请号:EP08837162.0申请日:20081009公开号:EP2208522A1公开日:20100721
专利附图:
摘要:A gas purification method of the present invention uses a carbon membranehaving a molecular sieving action to purify at least one selected from the group
consisting of a hydride gas, a hydrogen halide gas, and a halogen gas, each gas containing
an impurity at 10 ppm or less. The present invention can be used for a recovery unit thatrecoveries a used gas to reuse it as an ultrapure semiconductor material gas, and a unitor equipment that produces or charges an ultrapure semiconductor material gas.
申请人:Taiyo Nippon Sanso Corporation,National Institute of Advanced IndustrialScience and Technology
地址:3-26, Koyama 1-chome Shinagawa-ku Tokyo 142-8558 JP,3-1, Kasumigaseki 1-chome Chiyoda-ku Tokyo 100-21 JP
国籍:JP,JP
代理机构:Lamb, Martin John Carstairs
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