您好,欢迎来到抵帆知识网。
搜索
您的当前位置:首页GAS PURIFICATION METHOD

GAS PURIFICATION METHOD

来源:抵帆知识网
专利内容由知识产权出版社提供

专利名称:GAS PURIFICATION METHOD发明人:MIYAZAWA, Yuzuru,KOBAYASHI,

Yoshihiko,HARAYA, Kenji,YOSHIMUNE, Miki

申请号:EP08837162.0申请日:20081009公开号:EP2208522A1公开日:20100721

专利附图:

摘要:A gas purification method of the present invention uses a carbon membranehaving a molecular sieving action to purify at least one selected from the group

consisting of a hydride gas, a hydrogen halide gas, and a halogen gas, each gas containing

an impurity at 10 ppm or less. The present invention can be used for a recovery unit thatrecoveries a used gas to reuse it as an ultrapure semiconductor material gas, and a unitor equipment that produces or charges an ultrapure semiconductor material gas.

申请人:Taiyo Nippon Sanso Corporation,National Institute of Advanced IndustrialScience and Technology

地址:3-26, Koyama 1-chome Shinagawa-ku Tokyo 142-8558 JP,3-1, Kasumigaseki 1-chome Chiyoda-ku Tokyo 100-21 JP

国籍:JP,JP

代理机构:Lamb, Martin John Carstairs

更多信息请下载全文后查看

因篇幅问题不能全部显示,请点此查看更多更全内容

Copyright © 2019- dfix.cn 版权所有 湘ICP备2024080961号-1

违法及侵权请联系:TEL:199 1889 7713 E-MAIL:2724546146@qq.com

本站由北京市万商天勤律师事务所王兴未律师提供法律服务